Inline TCO Coating Equipment (Magnetron Sputter,PVD)
Inline TCO Coating Equipment (Magnetron Sputter,PVD)
Coating Principle
·Magnetron Sputter (PVD).
Features
·Multiple cathode operation for seed layer and multiple refractive index tandem TCO.
Compatible Wafer Size
·M10, M12/G12, Full / Half Cell.
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